博莱霉素在Ni/GC离子注入修饰电极上的电化学行为及其应用

目的：研究博莱霉素在Ni/GC离子注入修饰电极上的电化学行为及其应用。方法：博莱霉素在0.1 mol.L^-1 HAc-NaAc (pH 4.62)缓冲溶液中，用离子注入镍的修饰玻碳电极为工作电极进行伏安测定。结果：得到一良好的还原峰，峰电位Ep=-1.16 V (vs.SCE)。峰电流与博莱霉素浓度在1.0×10^-6～1.4×10^-5 mol.L^-1范围内成线性关系。检出限为8.0×10^-7 mol.L^-1。并用于尿样的测定，得到满意的结果。用线性扫描和循环伏安法研究了体系的电化学行为。用奥歇电子能谱(AES)和光电子能谱(XPS)等表面分析技术检测了注入电极表面的元素组成、价态和深度分布，对离子注入电极的催化性质进行了探讨。结论：体系属两电子还原的不可逆过程。

ELECTROCHEMICAL BEHAVIOR OF BLEOMYCIN AND ITS APPLICATION AT Ni/GC ION IMPLANTATION MODIFIED ELECTRODE

AIM: To sdudy the electrochemical behavior of bleomycin at Ni/GC electrode and its application. METHODS: With Ni/GC ion implantation modified electrode as working electrode, the behavior of bleomycin was studied by voltammetry in 0.1 mol.L^-1 HAc-NaAc (pH 4.62) buffer solution. RESULTS: A sensitive reductive peak of bleomycin was obtained by linear sweep voltammetry. The peak potential was -1.15 V (vs.SCE). The peak current was proportional to the concentration of bleomycin over the range of 1.0×10^-6～1.4×10^-5 mol.L^-1. The limit of detection was 8.0×10^-7 mol.L^-1. The behavior of the reduction peak was studied and applied to the determination of bleomycin in urine. CONCLUSION: The reduction process was irreversible. The element composition, atomicity form and depth of distribution at the surface of Ni/GC electrode were determined by Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy(XPS). The catalysis behavior at Ni/GC ion implantation modified electrode was also studied.