氧氟沙星在Pt/GC离子注入修饰电极上的电化学行为及其应用

目的　研究氧氟沙星在Pt/GC离子注入修饰电极上的电化学行为。方法　氧氟沙星在0.40mol·L^-1KCl溶液中，用Pt/GC离子注入修饰电极进行伏安测定。结果　得到一良好的还原峰，峰电位Ep=-1.35V(vsSCE)。峰电流与氧氟沙星的浓度在1.0×10^-6-3.0×10^-5mol·L^-1呈线性关系，相关系数γ=0.9992；检出限为5.0×10^-7mol·L^-1。该法用于药片的测定，获得满意结果。用线性扫描和循环伏安法等电化学手段研究体系的电化学行为和电极反应机理。用俄歇电子能谱(AES)、光电子能谱(XPS)和扫描电子显微镜(SEM)等表面分析技术检测了注入电极表面的元素的组成、价态和深度分布，对离子注入电极的催化性质进行了探讨。结论　实验表明，体系属于两电子还原的不可逆过程。

ELECTROCHEMICAL BEHAVIOR OF OFLOXACIN AT Pt/GC ION IMPLANTATION MODIFIED ELECTRODE AND ITS APPLICATION

AIM: To study the electrochemical behavior of ofloxacin at Pt/GC ion implantation modified electrode. METHODS: With Pt/GC ion implantation modified electrode as working electrode, the behavior of ofloxacin was studied by voltammetry in 0.40 mol.L-1 KCl solution. RESULTS: A sensitive reductive peak of ofloxacin was obtained by linear sweep voltammetry. The peak potential was -1.35 V (vs SCE). The peak current was proportional to the concentration of ofloxacin over the range of 1.0 x 10(-6)-3.0 x 10(-5) mol.L-1 with the detection limit of 5.0 x 10(-7) mol.L-1. The behavior of reduction wave was studied and applied to determination of ofloxacin in tablets. CONCLUSION: The reduction process was irreversible. The element composition, atomicity form and depth of distribution at the surface of Pt/GC electrode were determined by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and scanning electron microscope (SEM). The catalysis behavior and reaction mechanism at Pt/GC modified electrode was also studied.