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用磁控溅射技术制备钛合金表面羟基磷灰石生物涂层
引用本文:林东洋,赵玉涛,张钊,施秋萍. 用磁控溅射技术制备钛合金表面羟基磷灰石生物涂层[J]. 中国组织工程研究与临床康复, 2006, 10(33): 155-157
作者姓名:林东洋  赵玉涛  张钊  施秋萍
作者单位:江苏大学材料科学与工程学院,江苏省,镇江市,212013
基金项目:江苏省自然科学基金;江苏大学校科研和教改项目
摘    要:背景:射频磁控溅射是在陶瓷(金属)基体上制备金属(陶瓷)涂层的成熟技术,具有基体温升低、沉积速度快、涂层成分均匀、性能稳定、结合强度高等优点。目的:探讨磁控溅射法制备的羟基磷灰石生物涂层组织结构以及涂层与基体的界面结合性能。设计:单一样本观察。单位:江苏大学材料科学与工程学院。材料:试样基体为30mm×30mm×3mmTi-6Al-4V板材;JGP500超高真空多靶磁控溅射仪。方法:实验于2003-12/2004-09在江苏大学材料试验中心完成。利用射频磁控溅射技术在Ti-6Al-4V基体表面制备羟基磷灰石生物涂层,利用扫描电镜观察生物涂层表面形貌和断面形貌,利用X射线衍射仪分析涂层的相结构,利用能量分散谱仪分析涂层的Ca/P比,采用环氧树脂E-7对接法测定涂层与基体的界面结合强度。主要观察指标:①羟基磷灰石生物涂层微观形貌。②羟基磷灰石生物涂层组成及后处理影响。③羟基磷灰石生物涂层与基体的界面结合状态及结合强度。结果:①羟基磷灰石生物涂层表面扫描电镜观察,涂层表面较为粗糙,呈凹凸不平状,呈现出较多的孔隙和网状结构,其孔隙面积约占30%~40%。②溅射羟基磷灰石生物涂层的Ca/P比为1.7。后处理生物涂层主要成分为晶化程度高的羟基磷灰石,不存在其他钙磷杂质相。③羟基磷灰石涂层与基体的界面结合强度为51.2MPa。结论:射频磁控溅射技术制备的羟基磷灰石生物涂层,表面形貌良好,涂层与基体的界面结合强度较高。

关 键 词:材料试验  羟基磷灰石类  生物相容性材料
文章编号:1671-5926(2006)33-0155-03
修稿时间:2005-11-15

Preparation of hydroxyapatite coating deposited on the titanium alloy surface with magnetron sputtering technique
Lin Dong-yang,Zhao Yu-tao,Zhang Zhao,Shi Qiu-ping. Preparation of hydroxyapatite coating deposited on the titanium alloy surface with magnetron sputtering technique[J]. Journal of Clinical Rehabilitative Tissue Engineering Research, 2006, 10(33): 155-157
Authors:Lin Dong-yang  Zhao Yu-tao  Zhang Zhao  Shi Qiu-ping
Abstract:BACKGROUND: Radio frequency (RF) magnetron sputtering is a mature technique to prepare metallic (ceramic) coating on ceramic (metallic) substrate, which possesses low-amplitude temperature increasing substrate,rapid deposition rate, even coating component, stable performance, high binding intensity and other advantages.OBJECTIVE: To investigate the structure of hydroxyapatite(HA) coating prepared with RF magnetron sputtering technique and the binding performance of coating and interface of substrate.DESIGN: Single-sample observation.SETTING: College of Material Science and Engineering, Jiangsu University.MATERIALS: 30 mm×30 mm×3 mm Ti-6Al-4V plate and JGP500 MultiFunction Ultrahigh Vacuum Magnetron Sputtering System were used in this experiment.METHODS: This experiment was carried out at the Center of Material Experiment, Jiangsu University from December 2003 to September 2004.HA coating was prepared on the surface of Ti-6Al-4V substrate with RF magnetron sputtering technique, appearance of coating surface and crosssection were observed with scanning electron microscope (SEM), phase structure of coating was analyzed with X-ray diffractometer,Ca/P of coating was analyzed with Energy Dispersive X-ray Spectrometer and binding intensity of coating and interface of substrate was measured with e thoxyline resin-7 butt joint.MAIN OUTCOME MEASURES: ① Micro-appearance of HA coating.② Composition of HA coating and the effect of postprocessing. ③ Binding status and intensity of HA coating and substrate interface.RESULTS: ①Under the SEM, coating surface of HA was rough and uneven in surface, presented many pores and reticular structure. Pore area was about 30% to 40%. ② Ca/P of HA coating was 1.7. The essential component of treated HA coating was HA with high crystallization, without other calcium and phosphonium phase. ③ The binding intensity of HA coating and substrate interface was 51.2 MPa.CONCLUSION: HA coating prepared with RF magnetron sputtering technique has good appearance, high binding intensity at the interface of substrate.
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