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低强度半导体激光对脑缺血再灌注大鼠IL-6的影响
引用本文:解建波. 低强度半导体激光对脑缺血再灌注大鼠IL-6的影响[J]. 神经疾病与精神卫生, 2001, 1(3): 24-26
作者姓名:解建波
作者单位:276003,山东省临沂市人民医院神经内科
摘    要:目的 观察低强度半导体激光(LISCL)疗法对脑缺血再灌注大鼠IL-6的影响。方法 应用LISCL经腹腔辐照治疗线栓法所制作的大鼠脑缺血再灌注模型,采用免疫组织化学方法检测脑组织IL-6的变化。结果 (1)IL-6在正常神经元与胶质细胞仅有少量表达,缺血再灌注6 h IL-6表达较正常神经元稍增多,但无统计学意义(P>0.05),12 h开始在梗死周围区增高,第3天显著增强,以后逐渐下降。(2)LISCL治疗后与对照组比较,IL-6表达明显降低(P<0.01)。结论LISCL治疗可显著抑制缺血损伤区IL-6过度表达,减轻脑组织的损伤。

关 键 词:IL-6 脑缺血再灌注 大鼠 低强度半导体激光 治疗 表达 正常 结论 目的 意义
文章编号:1009-6574(2001)03-0024-03
修稿时间:2001-05-13

The Influence of Low Intensity Semiconductor Laser on Expression of IL - 6 in Cerebral Ischemia Reperfusion Rats
Xie Jianbo.. The Influence of Low Intensity Semiconductor Laser on Expression of IL - 6 in Cerebral Ischemia Reperfusion Rats[J]. Nervous Diseases and Mental Health, 2001, 1(3): 24-26
Authors:Xie Jianbo.
Abstract:Objective To observe the influence of low intensity semiconductor laser (LISCLT) on the IL- 6 in cerebral ischemia and reperfusion rats. Methods Ischemia and repcrfusion model made by line embolism method was irradiated with LISCLT, the IL -6 in brain was detected by immunohistochemical method. Results Normal neuron can express little IL- 6.There was no statistical significance between the expression at 6h after ischemia reperfusion and that of normal group. The expression began to increase at 12h ( P <0.01 ), arrive at the peak at the 3th day in the infarction boundary zone, and then decrease in the later days. Comparing with the control group, the expression of IL - 6 after LISCLT therapy decreases obviously (P <0. 01). Conclusions LISCLT can inhibit the expression of IL- 6, which can damage the brain tissue, and abate the brain injury.
Keywords:IL-6 Semiconductor laser Cerebral ischemia and reperfusion
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