Controlling room temperature ferromagnetism and band gap in ZnO nanostructured thin films by varying angle of implantation |
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Authors: | Rajesh V. Hariwal,Hitendra K. Malik,Ambika Negi,Asokan Kandasami |
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Affiliation: | Inter-University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi – 110067 India.; Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016 India ; Department of Physics, Acharya Narendra Dev College, University of Delhi, New Delhi-110019 India |
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Abstract: | The defects in the host lattice play a major role in tuning the surface roughness, optical band gap and the room temperature ferromagnetism (RTFM) of ZnO thin films. Herein, we report a novel approach to tailor the band gap and RTFM of a ZnO nanostructure by varying the angle of implantation of 60 keV N ions keeping the ion fluence of 1 × 1016 ions per cm2 and the beam size of 3 mm constant. The implantation was performed by changing the thin films'' orientations at 30°, 60° and 90° with respect to the incident beams. Remarkably, an enhancement of ∼6 times in RTFM, tuning in band gap from 3.27 to 3.21 eV and ∼60% reduction in surface roughness were noticed when the ion implantation was done at 60° to the normal. This novel technique may be suitable for tuning the physical properties of nanostructures for their application in the spintronics, semiconductor and solar cell industries.The defects in the host lattice play a major role in tuning the surface roughness, optical band gap and the room temperature ferromagnetism of ZnO thin films. |
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