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Contrast Inversion in TEM Studies of Poly(ferrocenylsilane)‐block‐Poly(dimethylsiloxane) Diblock Copolymers
Authors:Yishan Wang  Neil Coombs  Ian Manners  Mitchell A. Winnik
Affiliation:1. Department of Chemistry, University of Toronto, Toronto, Ontario M5S 3H6, Canada;2. School of Chemistry, University of Bristol, Bristol BS8 1TS, UK
Abstract:This paper describes an unusual contrast inversion phenomenon in TEM imaging of PFS‐b‐PDMS block copolymer bulk samples. It is clearly observed especially in samples that show a lamellar morphology that the contrast inversion is accompanied by a contraction of the PDMS domains and an expansion of the Fe‐rich domains. The location of the iron‐ and silicon‐rich domains was monitored by EDX analysis. We infer that the contrast inversion was caused by electron beam radiation‐induced damage to, and possible cross‐linking of, PDMS chains. A simple way to selectively deposit metal on electron beam patterned polymer film was demonstrated.
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Keywords:block copolymers  contrast inversion  electron beam damage  poly(ferrocenylsilane)s  poly(dimethylsiloxane)s  TEM
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