羟基磷灰石义眼台眶内植入术并发症的相关分析和预防处理

目的:探讨羟基磷灰石义眼台植入后义眼台暴露的原因处理方法及相关预防。方法:对本院2000/2003年收治的62眼(A组),2004/2007年收治的65眼(B组)I期羟基磷灰石义眼台植入术患者的治疗方法、效果及并发症分别进行回顾性分析。结果:手术的主要并发症为义眼台暴露,共12例,A组10例(16.1%),B组2例(3.1%)。发生时间为术后3~15d,义眼台暴露范围为3~14mm,能自行愈合者4眼,手术修补8眼,术后随访。结论:义眼台暴露的原因与手术方法和技巧、手术时机、炎症、术后感染等因素有关。其处理可根据范围不同采用不同方法。

Analysis and prevention methods for the complications of orbital hydroxyapatite implantation

AIM: To discuss the causes, managements and prevention methods of orbital implant exposure after hydroxyapatite(HA) implantation.·METHODS: A retrospective analysis of 62 eyes between 2002 and 2003(group A), 65 eyes between 2004 and 2007(group B) with HA orbital implant exposure was conducted. ·RESULTS: The common complication was orbital implant exposure (12 eyes), 10 eyes (16.1%)in group A and 2 eyes(3.1%)in group B, which occurred 3 to 15 days after implantation. The range of exposure was 3-14mm. Four eyes with exposure were managed conservatively and the conjunctival dehiscence healed spontaneously, and 8 eyes were managed by operation. Follow-up was done after operation. ·CONCLUSION: The reasons of exposure of the HA orbital implant are related to surgery method, surgery opportunity, inflammation and postoperative infection and so on. Different methods may be applied to manage HA orbital implant exposure according to the sizes of exposure. ·