Structural,optical, and magnetic properties of Ag+, Mn+ and Ar+ ions implanted ZnO thin films: effect of implantation dose and stopping energy |
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| Authors: | Weon Cheol Lim Jitendra Pal Singh Jonghan Song Tae-Yeon Seong Keun Hwa Chae |
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| Affiliation: | Advanced Analysis and Data Center, Korea Institute of Science and Technology, Seoul 02792 Republic of Korea.; Department of Materials Science and Engineering, Korea University, Seoul 02841 Republic of Korea.; Department of Physics, Manav Rachna University, Faridabad Haryana 121004 India |
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| Abstract: | Herein, we systematically studied the effect of various excitation processes on the structural, optical, and magnetic properties of ZnO films implanted with 80 keV Ar+, 110 keV Mn+, and 190 keV Ag+ ions. Four different doses of 1 × 1013, 1 × 1014, 1 × 1015, and 2 × 1016 ions per cm2 were used for implantation. It was observed that the structural, optical, and magnetic properties of the implanted samples were dominantly affected at the highest dose of 2 × 1016 ions per cm2. For lower doses, insignificant changes in these properties were observed. A comparison of various processes involved in the implantation process shows that both the electronic excitation and nuclear excitation processes are responsible for the changes in the structural, optical, and magnetic properties of the implanted ZnO films.Dominant changes in structural, optical, and magnetic properties were observed at the highest dose of implanted ions with larger ionic radii which is due to the large number of produced defects in the host. |
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