首页 | 本学科首页   官方微博 | 高级检索  
检索        

造影剂对2型糖尿病患者氧化应激的影响
引用本文:刘同刚,韩洪林,孙景玲.造影剂对2型糖尿病患者氧化应激的影响[J].包头医学院学报,2011,27(3):54-55.
作者姓名:刘同刚  韩洪林  孙景玲
作者单位:邳州市人民医院放射科,江苏,邳州,221300;邳州市人民医院放射科,江苏,邳州,221300;邳州市人民医院放射科,江苏,邳州,221300
摘    要:目的:研究造影剂对2型糖尿病患者氧化应激的影响。方法:15例行静脉肾盂造影的2型糖尿病患者,应用的造影剂为低渗非离子造影剂碘海醇,检测造影前和造影后2 d、5 d、10 d血清丙二醛(MDA)、晚期蛋白质氧化物(AOPP)和超氧化物歧化酶(SOD)的水平。结果:造影后2 d,患者氧化应激水平均较造影前增高(P〈0.05);造影后5 d,氧化应激水平进一步增高(P〈0.01);造影后10 d,氧化应激水平均恢复至造影前水平(P〉0.05)。结论:造影剂可一过性增强2型糖尿病患者氧化应激水平。

关 键 词:造影剂  2型糖尿病  氧化应激

Effects of Contrast Medium on Oxidative Stress in Patients with Type 2 Diabetes Mellitus
LIU Tonggang,HAN Honglin,SUN Jingling.Effects of Contrast Medium on Oxidative Stress in Patients with Type 2 Diabetes Mellitus[J].Journal of Baotou Medical College,2011,27(3):54-55.
Authors:LIU Tonggang  HAN Honglin  SUN Jingling
Institution:(Department of Radiology,Pizhou People’s Hospital,Pizhou 221300,China)
Abstract:Objective: To investigate the effects of contrast medium on oxidative stress in patients with type 2 diabetes mellitus.Methods: Thirty patients with type 2 diabetes mellitus who were performed arteriography were enrolled.All patients received hypotonic nonionic contrast agent iohexol.Serum malondialdehyde(MDA),advanced oxidation protein products(AOPP) and superoxide dismutase(SOD) were determined on the day before and 2 days,5 days,10 days after exposure to contrast medium.Results: Two days after contrast medium administration,the levels of oxidative stress in patients were significantly increased.Five days after contrast medium administration,the levels of oxidative stress in patients were significantly increased furthermore.However,ten days after contrast medium administration,the abilities of oxidative stress in patients returned to original levels.Conclusion: Contrast medium could transiently strengthen the abilities of oxidative stress in patients with type 2 diabetes mellitus.
Keywords:Contrast medium  Type 2 diabetes mellitus  Oxidative stress
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号