首页 | 本学科首页   官方微博 | 高级检索  
检索        


Salivary tissue factor concentration and activity in patients with oral lichen planus
Authors:Tugba Tunali-Akbay  Zeliha Solmaz  Filiz Namdar Pekiner  Hazal ?pekci
Institution:1. Marmara University, Faculty of Dentistry, Basic Medical Sciences Department, Istanbul, Turkey;2. Marmara University, Faculty of Dentistry, Oral Diagnosis and Radiology Department, Istanbul, Turkey
Abstract:

Purpose

This study aimed to evaluate the tissue factor (TF) concentration and activity in patients with oral lichen planus (OLP) under oxidative stress.

Methods

Twenty patients with OLP were selected from the patients who were referred for treatment to the Marmara University, Faculty of Dentistry, Oral and Maxillofacial Radiology Department. Twenty healthy subjects from faculty staff and their family members were selected for the study. Salivary TF concentration and TF activity; total oxidant capacity; total antioxidant capacity; total thiol, malondialdehyde and glutathione concentrations; and oxidative stress index were measured in saliva samples.

Results

Salivary total oxidant capacity, oxidative stress index and malondialdehyde and TF concentration and activity were significantly increased in the patient group compared to those in the control group. Total thiol and glutathione concentration and total antioxidant capacity were significantly decreased in the patient group.

Conclusion

Impaired oxidant-antioxidant balance and inflammatory features of OLP might cause an increase in the salivary TF concentration and activity. As TF factor plays a critical role in inflammation progress, the use of an antioxidant agent in OLP may decrease the salivary TF concentration by decreasing oxidative stress. The findings of this study might represent a novel approach to OLP monitoring and treatment in terms of TF as the measurement of TF is easy and cost-effective.
Keywords:Oral lichen planus  Tissue factor  Oxidative stress  Saliva
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号