首页 | 本学科首页   官方微博 | 高级检索  
     


(Cr1−xAlx)N Coating Deposition by Short-Pulse High-Power Dual Magnetron Sputtering
Authors:Alexander Grenadyorov  Vladimir Oskirko  Alexander Zakharov  Konstantin Oskomov  Andrey Solovyev
Affiliation:The Institute of High Current Electronics SB RAS, 2/3, Akademichesky Ave., 634055 Tomsk, Russia
Abstract:The paper deals with the (Cr1−xAlx)N coating containing 17 to 54 % Al which is deposited on AISI 430 stainless steel stationary substrates by short-pulse high-power dual magnetron sputtering of Al and Cr targets. The Al/Cr ratio in the coating depends on the substrate position relative to magnetrons. It is shown that the higher Al content in the (Cr1−xAlx)N coating improves its hardness from 17 to 28 GPa. Regardless of the Al content, the (Cr1−xAlx)N coating manifests a low wear rate, namely (4.1–7.8) × 10−9 and (3.9–5.3) × 10−7 mm3N−1m−1 in using metallic (100Cr6) and ceramic (Al2O3) counter bodies, respectively. In addition, this coating possesses the friction coefficient 0.4–0.7 and adhesive strength quality HF1 and HF2 indicating good interfacial adhesion according to the Daimler-Benz Rockwell-C adhesion test.
Keywords:CrAlN coating   hardness   wear resistance   dual-HiPIMS with short pulses   100Cr6 counter body   Al2O3 counter body
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号