(Cr1−xAlx)N Coating Deposition by Short-Pulse High-Power Dual Magnetron Sputtering |
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Authors: | Alexander Grenadyorov Vladimir Oskirko Alexander Zakharov Konstantin Oskomov Andrey Solovyev |
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Affiliation: | The Institute of High Current Electronics SB RAS, 2/3, Akademichesky Ave., 634055 Tomsk, Russia |
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Abstract: | The paper deals with the (Cr1−xAlx)N coating containing 17 to 54 % Al which is deposited on AISI 430 stainless steel stationary substrates by short-pulse high-power dual magnetron sputtering of Al and Cr targets. The Al/Cr ratio in the coating depends on the substrate position relative to magnetrons. It is shown that the higher Al content in the (Cr1−xAlx)N coating improves its hardness from 17 to 28 GPa. Regardless of the Al content, the (Cr1−xAlx)N coating manifests a low wear rate, namely (4.1–7.8) × 10−9 and (3.9–5.3) × 10−7 mm3N−1m−1 in using metallic (100Cr6) and ceramic (Al2O3) counter bodies, respectively. In addition, this coating possesses the friction coefficient 0.4–0.7 and adhesive strength quality HF1 and HF2 indicating good interfacial adhesion according to the Daimler-Benz Rockwell-C adhesion test. |
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Keywords: | CrAlN coating hardness wear resistance dual-HiPIMS with short pulses 100Cr6 counter body Al2O3 counter body |
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