On the Deposition Process of Ceramic Layer Thin Films for Low-Carbon Steel Pipe Protection |
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Authors: | Stefan Irimiciuc Marius Gabriel Zaharia Ramona Cimpoesu Georgiana Bulai Silviu Octavian Gurlui Nicanor Cimpoesu |
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Affiliation: | 1.Laser Department, National Institute for Lasers, Plasma and Radiation Physics, 077125 Bucharest, Romania;2.Faculty of Material Science and Engineering, Gheorghe Asachi Technical University of Iasi, 59A Mangeron Bld., 700050 Iasi, Romania; (M.G.Z.); (N.C.);3.Spectroscopy and Laser Laboratory (LOASL), Faculty of Physics, Atmosphere Optics, Alexandru Ioan Cuza University of Iasi, 11 Carol I Bld., 700506 Iasi, Romania; |
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Abstract: | Ceramic thin films with variable thicknesses have been used in many applications. In order to protect the petroleum transportation pipes against the harmful H2S action, two ceramic materials as thin layers are proposed. In this article, pulsed laser deposition (PLD) of ceramic layers by in situ time-resolved optical techniques is investigated. Two ceramic materials were used as targets and real-time monitoring of the PLD process was realized via ICCD fast camera imaging and optical emission spectroscopy. The space–time displacement of the ceramic emissions was analyzed in order to determine the plasma structure and respective kinetic energies. Spectral-resolved investigation allowed the determination of plasma species individual velocities (in the first case: 43 km/s for C ionic species, 11 km/s for Si, from 25 to 5 km/s for atomic species; in the second case: 32 km/s for C ionic species, 11 km/s for W species, and 15 and 53 km/s for neutral species). SEM and AFM techniques were implemented to analyze the resulting ceramic layers showing homogeneous surfaces with characteristic material droplets. The ablation crater also reveals selective ablation during the deposition process. EDX results show that Al/Si is retained in the thin films similar to the target composition. |
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Keywords: | ceramic thin film pulsed laser deposition optical emission spectroscopy electron temperature ICCD imaging plasma structuring |
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