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多种抛光磨头对烤瓷表面粗糙度的影响
引用本文:任辉,蔡晓彤,唐卫峰.多种抛光磨头对烤瓷表面粗糙度的影响[J].实用口腔医学杂志,2016(3):341-344.
作者姓名:任辉  蔡晓彤  唐卫峰
作者单位:北京大学口腔医院第三门诊部综合三科,100191
摘    要:目的:比较釉瓷上釉和不同打磨抛光磨头处理后,烤瓷表面粗糙度的不同,为临床选择抛光方法提供实验依据。方法:制作圆盘状瓷片70片,随机分为7组(n =10)。以釉瓷上釉作对照为第1组,第2组至第7组均用松风氧化铝白砂石打磨,第2组打磨后不做处理;第3组打磨后使用松风 Ceramiste 烤瓷抛光套装磨头抛光;第4组在第3组的基础上加用松风Ceramaster 精细烤瓷抛光磨头抛光;第5组打磨后使用德国固美(Komer)烤瓷抛光套装磨头抛光;第6组打磨后使用固美氧化锆抛光磨头抛光;第7组打磨后使用德国 EVE 氧化锆抛光磨头抛光。对瓷片进行轮廓算术平均偏差(Ra)、轮廓的微观不平度十点高度(Rz)、最大轮廓峰高(Rp)的测量,使用 SPSS 16.0统计软件对测量值进行单因素方差分析,并采用扫描电镜对表面形态进行观察。结果:第2、3组的 Ra、Rp 值均大于第1组(P <0.05);第4、5、6、7组的 Ra、Rp 值与第1组差异无显著性(P >0.05);第2、3、4、5组的 Rz 值均大于第1组(P <0.05);第6、7组的 Rz 值与第1组无显著性差异(P >0.05)。电镜下观察第6、7组与第1组瓷面平整度相似;第4、5组瓷面较平整,凹坑较少;第2、3组瓷面棱脊、凹坑较多。结论:使用打磨颗粒为微米级超细天然金刚砂的抛光磨头能达到类似上釉的效果。

关 键 词:烤瓷  抛光  表面粗糙度  扫描电镜

Performance of different polishing techniques for Vita ceramic restorations
Abstract:Objective:To compare the effects of different polishing techniques on the surface roughness of ceramic surfaces,provi-ding reference to restoration polishing in clinic.Methods:70 disc-shaped ceramic specimens were randomly divided into 7 groups(n=10).The glazing treated samples were served as the controls(group 1),the rest samples were treated by white aluminum oxide stone only(group 2)or followed by the polishing head of Ceramiste(group 3),Ceramiste and Ceramaster(group 4),Komer porcelain (group 5),Komer zirconium oxide(group 6)and EVE zirconium oxide,respectively.Roughness of the ceramic samples(including Ra,Rz and Rp)was measured with surface profilometry after different process and the data were analyzed by one way ANOVA.The surface characteristics of the specimens were observed by scanning electron microscopy.Results:The Ra and Rp of group 2 and 3 was higher than those of group 1(P <0.05).The Rz of group 2,3,4 and 5 was higher than that of group 1(P <0.05).Conclusion:Polishers interspersed with diamond grit may achieve a finish equal in smoothness to the glazed surface.
Keywords:Dental ceramic  Polishing  Surface roughness  Scanning electron microscope
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