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Oxygen‐Mediated Reactions in Photopolymerizable Radical Thin Films: Application to Simultaneous Photocuring Under Air and Nanoparticle Formation
Authors:Jacques Lalevée  Julie Bourgon  Romain Poupart  Eric Leroy  Javier Cerezo Batisda  Jean‐Pierre Fouassier  Davy‐Louis Versace
Affiliation:1. Institut de Science des Matériaux de Mulhouse (IS2M), UMR CNRS 7361, Mulhouse, CEDEX, France;2. Institut de Chimie et des Matériaux Paris‐Est (ICMPE), UMR CNRS 7182, Université Paris‐Est Créteil (UPEC), Thiais, France;3. Departamento di Quimica Fisica, Universidad de Murcia, Murcia, Spain;4. Formerly, ENSCMu‐UHA, Mulhouse, CEDEX, France
Abstract:Titanium propoxide, titanium isopropoxide, and titanium (triethanolaminato) isopropoxide are proposed as high‐performance additives to overcome the oxygen inhibition effects in the free radical photopolymerization of a low‐viscosity monomer thin film, under air and upon a low‐intensity UV light activation. Indeed, when added to a Type I photoinitiator such as bis(2,4,6‐trimethylbenzoyl)‐phenylphosphine oxide (BAPO), noticeably higher conversions are achieved under air (48% vs. 30%). The in situ formation of Ti‐based nanoparticles is also observed. The photochemical properties of these types of Ti‐based compounds as well as their interaction with BAPO are investigated by steady‐state photolysis and electron spin resonance. Molecular orbital calculations give an interesting insight into the possible reactions. A chemical mechanism is also proposed.
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Keywords:ESR‐spin trapping  free‐radical photopolymerizations  oxygen inhibition  photoinitiators  Ti‐based nanoparticles
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