Hf1−xSixO2 Nanocomposite Coatings Prepared by Ion-Assisted Co-Evaporation Process for Low-Loss and High-LIDT Optics |
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| Authors: | Hongfei Jiao Xinshang Niu Jinlong Zhang Bin Ma Xinbin Cheng Zhanshan Wang |
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| Institution: | 1.Key Laboratory of Advanced Micro-Structured Materials, Ministry of Education, Shanghai 200092, China; (X.N.); (J.Z.); (B.M.); (X.C.); (Z.W.);2.Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China |
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| Abstract: | Hf1−xSixO2 nanocomposites with different SiO2 doping ratios were synthesized using an ion-assisted co-evaporation process to achieve dense amorphous Hf1−xSixO2 coatings with low loss and a high laser-induced damage threshold (LIDT). The results showed that the Hf1−xSixO2 nanocomposites (x ≥ 0.20) exhibited excellent comprehensive performance with a wide band gap and a dense amorphous microstructure. High-temperature annealing was carried out to ensure better stoichiometry and lower absorption. Precipitation and regrowth of HfO2 grains were observed from 400 °C to 600 °C during annealing of the Hf0.80Si0.20O2 nanocomposites, resulting in excessive surface roughness. A phenomenological model was proposed to explain the phenomenon. The Hf1−xSixO2 nanocomposites (x = 0.3 and 0.4) maintained a dense amorphous structure with low absorption after annealing. Finally, a 1064-nm Hf0.70Si0.30O2/SiO2 high-performance reflector was prepared and achieved low optical loss (15.1 ppm) and a high LIDT (67 J/cm2). |
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| Keywords: | Hf1− xSixO2 nanocomposites ion-assisted co-evaporation process annealing dense amorphous structure low optical loss high LIDT |
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