长期接触低浓度二硫化碳对暴露人群DNA损伤的影响

目的 应用彗星试验方法检测长期接触低浓度二硫化碳(CS2)职业人群的口腔黏膜细胞DNA损伤以及损伤程度。方法 在湖北省某大型化纤厂随机抽取90例CS2接触工人作为暴露组,同时选择81例非接触工人作为对照组,进行彗星试验。结果 暴露组和对照组的彗星细胞拖尾率分别为0．51％和0．23％,经X^2检验,差异有非常显著性。另外,低作业年限暴露组(0．50％)和男性暴露组(0．56％)的彗星细胞拖尾率均非常显著高于对照组,分别为0．08％和0．25％。多因素非条件logistic回归分析结果表明,CS2暴露组DNA损伤的可能性明显高于对照组。结论 长期接触低浓度CS2,对工人口腔黏膜细胞的DNA有一定损伤。

Studies on DNA damage in workers with long-term exposure to lower concentration of carbon disulfide

Objective DNA damage in human buccal cells of workers occupationally long-term exposed to carbon disulfide(CS_2)was monitored with comet assay. Methods Ninety workers exposed to CS_2 were randomly selected as exposure group from a large-scale chemical fiber manufacturer in Hubei and 81 workers not exposed to CS_2 as control group. DNA damage in their buccal cells was detected with comet assay. Results Rate of DNA tail was 0.51% in exposure group, significantly higher than that in control group (0.23%), with very statistical significance. Rate of DNA tail was 0.50% in male exposure group and 0.56% in exposure group with short length of employment, significantly higher than that in control group (0.08% and 0.25%, respectively). Multivariate unconditional logistic regression anlaysis showed that possibility of DNA damage was significantly higher in exposure group than that in control group ( P <0.05). Conclusion Long-term exposure to lower concentration of carbon disulfide could cause certain damage to human buccal cell DNA.