首页 | 本学科首页   官方微博 | 高级检索  
     


Intrapartum to postpartum changes in colloid osmotic pressure
Authors:D B Cotton  B Gonik  T Spillman  K F Dorman
Affiliation:1. Department of Obstetrics and Gynecology, The University of Texas Health Science Center at Houston Houston, Texas USA.;2. Department of Pathology and Laboratory Medicine, The University of Texas Health Science Center at Houston Houston, Texas USA.
Abstract:A study was undertaken to determine the effect of route of delivery on plasma colloid osmotic pressure. Plasma colloid osmotic pressure was measured on admission to the hospital and 8 to 24 hours post partum in 72 patients at term with uncomplicated prenatal histories. Thirty-six patients underwent uncomplicated vaginal deliveries (local anesthesia, 18; conduction anesthesia, 18) and 36 patients had cesarean sections (conduction anesthesia, 18; general anesthesia, 18). The mean (+/- SD) intrapartum colloid osmotic pressure of the overall group was 21.0 +/- 2.1 mm Hg, and it declined significantly (p less than 0.01) to 15.4 +/- 2.1 mm Hg post partum. A comparison of the intrapartum and postpartum reductions in colloid osmotic pressure between patients who underwent vaginal delivery and those who underwent cesarean section revealed no significant differences. Furthermore, the mean reductions in colloid osmotic pressure when all four groups were compared by type of anesthesia were not significantly different. Fifteen patients (20.8%) in the study had a postpartum colloid osmotic pressure of less than 13.6 mm Hg, and five (6.9%) had a postpartum colloid pressure of less than 12.5 mm Hg. Our results indicate that, for normal pregnancy, colloid osmotic pressure is uniformly lowered in the post partum and, in some cases, to levels that have been reported to be dangerously low.
Keywords:Reprint requests: Dr. David B. Cotton   Department of Obstetrics and Gynecology   Baylor College of Medicine   One Baylor Plaza   Houston   TX 77030.
本文献已被 ScienceDirect PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号