自身腹水回输治疗肝硬化腹水机制的研究

目的 :探讨自身腹水回输治疗肝硬化腹水机制。方法 :将 40例常规治疗疗效不佳的肝硬化腹水病人随机分为两组 :实验组放腹水 2 0 0 0ml,其中 1 0 0 0ml静脉回输 ,再静脉注射速尿 6 0mg ;对照组放腹水 2 0 0 0ml,静脉点滴白蛋白 1 0g ,再静脉注射速尿 6 0mg。结果 :实验组术前、术后、术后第 4d血浆醛固酮 (ALD)、血浆心钠素 (ANF)、血浆内皮素 (ET)及术前、术后尿量、肾动脉血流量与对照组无明显差异 ;但是实验组血清白蛋白升高较稳定。结论 :自身腹水回输治疗肝硬化腹水的机制在于同时消除腹水和扩容两大治疗原则。由于有许多血管活性物质的参与 ,可能逆转了发生腹水的某些病理生理环节     

The role of immune mechanisms in alcoholic and nonalcoholic steatohepatitis: a 2015 update

So far, innate immune mechanisms have been recognized as the main responsible for the evolution of both alcoholic steatohepatitis (ASH) and nonalcoholic steatohepatitis (NASH). However, increasing evidence points toward the possible role of adaptive immune responses, as an additional factor in promoting hepatic inflammation in steatohepatitis. In this article, we discuss recent data involving circulating antibodies and lymphocyte-mediated responses in sustaining the progression of ASH and NASH to fibrosis, as well as the possible mechanisms implicated in favoring the onset of adaptive immunity in the setting of steatohepatitis.     

阿托伐他汀联合米力农治疗慢性心力衰竭的临床研究

目的探讨阿托伐他汀钙联合米力农注射液治疗慢性心力衰竭的临床疗效。方法选取2018年12月—2019年12月于河南省人民医院进行治疗的慢性心力衰竭患者93例,随机分为对照组(46例)和治疗组(47例)。对照组iv米力农注射液,首次采用50μg/kg负荷剂量静脉推注10 min,随后以0.25～0.50μg/(kg·min)静脉匀速泵入,连续使用72 h;治疗组患者则在对照组基础上口服阿托伐他汀钙片,10 mg/次,2次/d。两组均连续治疗1周。观察两组的临床疗效,比较两组治疗前后临床症状评分、6 min步行距离、心功能指标及血清去甲肾上腺素、细胞间黏附分子-1(ICAM-1)、超敏C反应蛋白(hs-CRP)、醛固酮(ALD)、脑自然肽氨基端前体蛋白(NT-proBNP)、心肌肌钙蛋白I(cTnI)水平。结果治疗后,对照组临床总有效率78.26%明显低于治疗组93.62%,两组比较差异具有统计学意义(P0.05)。治疗后,两组患者临床症状评分显著降低,但6 min步行距离显著升高(P0.05);且治疗后治疗组临床症状评分和6 min步行距离相较于对照组改善更为显著(P0.05)。治疗后,两组患者心功能指标左心室射血分数(LVEE)、左心室收缩末内径(LVESD)、左心室收缩末期容积(LVESV)均较治疗前明显改善(P0.05);且治疗后治疗组心功能相关指标相较于对照组改善更为显著(P0.05)。治疗后,两组患者血清去甲肾上腺素、ICAM-1、hs-CRP、ALD、NT-proBNP、cTnI水平均较治疗前明显降低(P0.05);且治疗后治疗组这些相关血清生化指标显著低于对照组(P0.05)。结论阿托伐他汀钙联合米力农注射液治疗慢性心力衰竭疗效确切,能显著改善患者临床症状及心功能指标,可改善患者相关血清生化指标,具有一定的临床推广应用价值。     

Extensive Analysis on the Effects of Post-Deposition Annealing for ALD-Deposited Al2O3 on an n-Type Silicon Substrate

In this study, an investigation was performed on the properties of atomic-layer-deposited aluminum oxide (Al₂O₃) on an n-type silicon (n-Si) substrate based on the effect of post-deposition heat treatment, which was speckled according to ambient temperature and treatment applied time. Based on these dealings, a series of distinctions for extracted capacitance and dielectric constant, hysteresis was performed on annealed and nonannealed samples. The interface and border trap responses, including stress behavior after an application of constant voltage for a specific time and surface morphology by X-ray diffraction (XRD) technique, were also analyzed between the two above-mentioned sample types. Based on observation, the annealed samples showed superior performance in every aspect compared with the nonannealed ones. Some unusual behaviors after high annealing temperature were found, and the explanation is the ion diffusion from oxide layer towards the semiconductor. Since a constant voltage stress was not widely used on the metal–oxide–semiconductor capacitor (MOSCAP), this analysis was determined to reveal a new dimension of post-deposition annealing condition for the Al/Al₂O₃/n-Si gate stack.