Multiple-mesa-fin-channel array patterned by a laser interference photolithography system and gallium oxide (Ga2O3) gate oxide layer deposited by a vapor cooling condensation system were employed in double-channel Al0.83In0.17N/GaN/Al0.18Ga0.82N/GaN heterostructured-metal-oxide-semiconductors (MOSHEMTs). The double-channel was constructed by the polarized Al0.18Ga0.82N/GaN channel 1 and band discontinued lattice-matched Al0.83In0.17N/GaN channel 2. Because of the superior gate control capability, the generally induced double-hump transconductance characteristics of double-channel MOSHEMTs were not obtained in the devices. The superior gate control capability was contributed by the side-wall electrical field modulation in the fin-channel. Owing to the high-insulating Ga2O3 gate oxide layer and the high-quality interface between the Ga2O3 and GaN layers, low noise power density of 8.7 × 10−14 Hz−1 and low Hooge’s coefficient of 6.25 × 10−6 of flicker noise were obtained. Furthermore, the devices had a unit gain cutoff frequency of 6.5 GHz and a maximal oscillation frequency of 12.6 GHz. 相似文献
In this work, Al0.83In0.17N/GaN/Al0.18Ga0.82N/GaN epitaxial layers used for the fabrication of double-channel metal–oxide–semiconductor high-electron mobility transistors (MOSHEMTs) were grown on silicon substrates using a metalorganic chemical vapor deposition system (MOCVD). A sheet electron density of 1.11 × 1013 cm−2 and an electron mobility of 1770 cm2/V-s were obtained. Using a vapor cooling condensation system to deposit high insulating 30-nm-thick Ga2O3 film as a gate oxide layer, double-hump transconductance behaviors with associated double-hump maximum extrinsic transconductances (gmmax) of 89.8 and 100.1 mS/mm were obtained in the double-channel planar MOSHEMTs. However, the double-channel devices with multiple-mesa-fin-channel array with a gmmax of 148.9 mS/mm exhibited single-hump transconductance behaviors owing to the better gate control capability. Moreover, the extrinsic unit gain cutoff frequency and maximum oscillation frequency of the devices with planar channel and multiple-mesa-fin-channel array were 5.7 GHz and 10.5 GHz, and 6.5 GHz and 12.6 GHz, respectively. Hooge’s coefficients of 7.50 × 10−5 and 6.25 × 10−6 were obtained for the devices with planar channel and multiple-mesa-fin-channel array operating at a frequency of 10 Hz, drain–source voltage of 1 V, and gate–source voltage of 5 V, respectively. 相似文献
A double-channel (DC) GaN/AlGaN high-electron-mobility transistor (HEMT) as a terahertz (THz) detector at 315 GHz frequency is proposed and fabricated in this paper. The structure of the epitaxial layer material in the detector is optimized, and the performance of the GaN HEMT THz detector is improved. The maximum responsivity of 10 kV/W and minimum noise equivalent power (NEP) of 15.5 pW/Hz0.5 are obtained at the radiation frequency of 315 GHz. The results are comparable to and even more promising than the reported single-channel (SC) GaN HEMT detectors. The enhancement of THz response and the reduction of NEP of the DC GaN HEMT detector mainly results from the interaction of 2DEG in the upper and lower channels, which improves the self-mixing effect of the detector. The promising experimental results mean that the proposed DC GaN/AlGaN HEMT THz detector is capable of the practical applications of THz detection. 相似文献
目的比较可视化精准穿刺与常规穿刺标准双通道经皮肾镜取石术(PCNL)治疗肾多发结石的临床疗效。方法分析2017年7月-2018年8月该科88例行标准双通道PCNL治疗肾多发性结石的患者的临床资料,随机分为两组:可视化精准穿刺标准双通道组(n=40)与常规穿刺标准双通道组(n=48),比较两组在建立第一通道、第二通道时间、手术时间、血红蛋白下降值、术后输血率、一期结石清除率及住院时间等指标。结果两组第一通道建立时间[(2.53±1.52)vs(4.83±1.82)min,t=6.32,P=0.000]、第二通道建立时间[(3.02±2.54)vs(6.92±4.81)min,t=7.42,P=0.000]、手术时间[(65.46±15.54)vs(80.32±13.62)min,t=26.64,P=0.000]、血红蛋白下降值[(9.21±2.52)vs(13.22±3.53)g/L,t=3.02,P=0.000]、术后输血率[5.00%(2/40) vs 8.33%(4/48),χ~2=0.01,P=0.001]、一期结石清除率[85.00%(34/40) vs81.25%(39/48),χ~2=3.21,P=0.008]和住院时间[(5.52±1.02)vs(7.63±1.21)d,t=0.61,P=0.001]差异均有统计学意义。结论可视化精准穿刺标准双通道与常规穿刺标准双通道PCNL在治疗肾多发结石中相比,前者具有缩短通道建立时间、缩短手术时间、减少出血、提高一期清石率和缩短住院时间等优点,使临床穿刺操作更加安全精准。 相似文献