Impact of Annealing on Magnetic Properties and Structure of Co40Fe40W20 Thin Films on Si(100) Substrate

Co₄₀Fe₄₀W₂₀ monolayers of different thicknesses were deposited on Si(100) substrates by DC magnetron sputtering, with Co₄₀Fe₄₀W₂₀ thicknesses from 10 to 50 nm. Co₄₀Fe₄₀W₂₀ thin films were annealed at three conditions (as-deposited, 250 °C, and 350 °C) for 1 h. The structural and magnetic properties were then examined by X-ray diffraction (XRD), low-frequency alternative-current magnetic susceptibility (χ_ac), and an alternating-gradient magnetometer (AGM). The XRD results showed that the CoFe (110) peak was located at 2θ = 44.6°, but the metal oxide peaks appeared at 2θ = 38.3, 47.6, 54.5, and 56.3°, corresponding to Fe₂O₃ (320), WO₃ (002), Co₂O₃ (422), and Co₂O₃ (511), respectively. The saturation magnetization (Ms) was calculated from the slope of the magnetization (M) versus the CoFeW thickness. The Ms values calculated in this manner were 648, 876, 874, and 801 emu/cm³ at the as-deposited condition and post-annealing conditions at 250, 350, and 400 °C, respectively. The maximum M_S was about 874 emu/cm³ at a thickness of 50 nm following annealing at 350 °C. It indicated that the M_S and the χ_ac values rose as the CoFeW thin films’ thickness increased. Owing to the thermal disturbance, the M_S and χ_ac values of CoFeW thin films after annealing at 350 °C were comparatively higher than at other annealing temperatures. More importantly, the Co₄₀Fe₄₀W₂₀ films exhibited a good thermal stability. Therefore, replacing the magnetic layer with a CoFeW film improves thermal stability and is beneficial for electrode and strain gauge applications.     

Effect of Yttrium Addition on Structure and Magnetic Properties of Co60Fe20Y20 Thin Films

In this paper, a Co₆₀Fe₂₀Y₂₀ film was sputtered onto Si (100) substrates with thicknesses ranging from 10 to 50 nm under four conditions to investigate the structure, magnetic properties, and surface energy. Under four conditions, the crystal structure of the CoFeY films was found to be amorphous by an X-ray diffraction analyzer (XRD), suggesting that yttrium (Y) added into CoFe films and can be refined in grain size and insufficient annealing temperatures do not induce enough thermal driving force to support grain growth. The saturation magnetization (M_S) and low-frequency alternate-current magnetic susceptibility (χ_ac) increased with the increase of the thicknesses and annealing temperatures, indicating the thickness effect and Y can be refined grain size and improved ferromagnetic spin exchange coupling. The highest Ms and χ_ac values of the Co₆₀Fe₂₀Y₂₀ films were 883 emu/cm³ and 0.26 when the annealed temperature was 300 °C and the thickness was 50 nm. The optimal resonance frequency (f_res) was 50 Hz with the maximum χ_ac value, indicating it could be used at a low frequency range. Moreover, the surface energy increased with the increase of the thickness and annealing temperature. The maximum surface energy of the annealed 300 °C film was 30.02 mJ/mm² at 50 nm. Based on the magnetic and surface energy results, the optimal thickness was 50 nm annealed at 300 °C, which has the highest Ms, χ_ac, and a strong adhesion, which can be as a free or pinned layer that could be combined with the magnetic tunneling layer and applied in magnetic fields.     

Effects of Annealing and Thickness of Co60Fe20Yb20 Nanofilms on Their Structure,Magnetic Properties,Electrical Efficiency,and Nanomechanical Characteristics

X-ray diffraction (XRD) analysis showed that metal oxide peaks appear at 2θ = 47.7°, 54.5°, and 56.3°, corresponding to Yb₂O₃ (440), Co₂O₃ (422), and Co₂O₃ (511). It was found that oxide formation plays an important role in magnetic, electrical, and surface energy. For magnetic and electrical measurements, the highest alternating current magnetic susceptibility (χ_ac) and the lowest resistivity (×10⁻² Ω·cm) were 0.213 and 0.42, respectively, and at 50 nm, it annealed at 300 °C due to weak oxide formation. For mechanical measurement, the highest value of hardness was 15.93 GPa at 200 °C in a 50 nm thick film. When the thickness increased from 10 to 50 nm, the hardness and Young’s modulus of the Co₆₀Fe₂₀Yb₂₀ film also showed a saturation trend. After annealing at 300 °C, Co₆₀Fe₂₀Yb₂₀ films of 40 nm thickness showed the highest surface energy. Higher surface energy indicated stronger adhesion, allowing for the formation of multilayer thin films. The optimal condition was found to be 50 nm with annealing at 300 °C due to high χ_ac, strong adhesion, high nano-mechanical properties, and low resistivity.     

Effect of Annealing Process on the Properties of Ni(55%)Cr(40%)Si(5%) Thin-Film Resistors

Resistors in integrated circuits (ICs) are implemented using diffused methods fabricated in the base and emitter regions of bipolar transistor or in source/drain regions of CMOS. Deposition of thin films on the wafer surface is another choice to fabricate the thin-film resistors in ICs’ applications. In this study, Ni(55%)Cr(40%)Si(5%) (abbreviated as NiCrSi) in wt % was used as the target and the sputtering method was used to deposit the thin-film resistors on Al₂O₃ substrates. NiCrSi thin-film resistors with different thicknesses of 30.8 nm~334.7 nm were obtained by controlling deposition time. After deposition, the thin-film resistors were annealed at 400 °C under different durations in N₂ atmosphere using the rapid thermal annealing (RTA) process. The sheet resistance of NiCrSi thin-film resistors was measured using the four-point-probe method from 25 °C to 125 °C, then the temperature coefficient of resistance could be obtained. We aim to show that resistivity of NiCrSi thin-film resistors decreased with increasing deposition time (thickness) and the annealing process had apparent effect on the sheet resistance and temperature coefficient of resistance. We also aim to show that the annealed NiCrSi thin-film resistors had a low temperature coefficient of resistance (TCR) between 0 ppm/°C and +50 ppm/°C.     

Investigation of the Oxidation Behavior of Cr20Mn17Fe18Ta23W22 and Microdefects Evolution Induced by Hydrogen Ions before and after Oxidation

The oxidation behavior of body-centered cubic (bcc) structure Cr₂₀Mn₁₇Fe₁₈Ta₂₃W₂₂ refractory high-entropy alloy (RHEA) and the microdefects induced by hydrogen ions before and after oxidation were investigated. The results revealed that compared with oxidizing Cr₂₀Mn₁₇Fe₁₈Ta₂₃W₂₂ at 800 °C (6.7 °C/min) for 4 h (ST3, Ar:O₂ = 3:1), the heating procedure of oxidizing Cr₂₀Mn₁₇Fe₁₈Ta₂₃W₂₂ at 300 °C (6 °C/min) for 2 h and then increased to 800 °C (5 °C/min) for 4 h is more conducive to the production of oxides without spalling on the surface, i.e., HT1 (Ar:O₂ = 1:1), HT2 (Ar:O₂ = 2:1) and HT3 (Ar:O₂ = 3:1) samples. The oxidation of Cr₂₀Mn₁₇Fe₁₈Ta₂₃W₂₂ RHEA is mainly controlled by the diffusion of cations instead of affinities with O. Additionally, HT1 and HT3 samples irradiated with a fluence of 3.9 × 10²² cm⁻² hydrogen ions (60 eV) were found to have a better hydrogen irradiation resistance than Cr₂₀Mn₁₇Fe₁₈Ta₂₃W₂₂ RHEA. The microdefects in irradiated Cr₂₀Mn₁₇Fe₁₈Ta₂₃W₂₂ mainly existed as hydrogen bubbles, hydrogen-vacancy (H-V) complexes and vacancy/vacancy clusters. The microdefects in irradiated HT3 were mainly vacancies and H-V complexes, while the microdefects in irradiated HT1 mainly existed as vacancies and vacancy clusters, as large amounts of hydrogen were consumed to react with oxides on the HT1 surface. The oxides on the surface of the HT3 sample were more stable than those on HT1 under hydrogen irradiation.     

Role of SiNx Barrier Layer on the Performances of Polyimide Ga2O3-doped ZnO p-i-n Hydrogenated Amorphous Silicon Thin Film Solar Cells

In this study, silicon nitride (SiN_x) thin films were deposited on polyimide (PI) substrates as barrier layers by a plasma enhanced chemical vapor deposition (PECVD) system. The gallium-doped zinc oxide (GZO) thin films were deposited on PI and SiN_x/PI substrates at room temperature (RT), 100 and 200 °C by radio frequency (RF) magnetron sputtering. The thicknesses of the GZO and SiN_x thin films were controlled at around 160 ± 12 nm and 150 ± 10 nm, respectively. The optimal deposition parameters for the SiN_x thin films were a working pressure of 800 × 10⁻³ Torr, a deposition power of 20 W, a deposition temperature of 200 °C, and gas flowing rates of SiH₄ = 20 sccm and NH₃ = 210 sccm, respectively. For the GZO/PI and GZO-SiN_x/PI structures we had found that the GZO thin films deposited at 100 and 200 °C had higher crystallinity, higher electron mobility, larger carrier concentration, smaller resistivity, and higher optical transmittance ratio. For that, the GZO thin films deposited at 100 and 200 °C on PI and SiN_x/PI substrates with thickness of ~000 nm were used to fabricate p-i-n hydrogenated amorphous silicon (α-Si) thin film solar cells. 0.5% HCl solution was used to etch the surfaces of the GZO/PI and GZO-SiN_x/PI substrates. Finally, PECVD system was used to deposit α-Si thin film onto the etched surfaces of the GZO/PI and GZO-SiN_x/PI substrates to fabricate α-Si thin film solar cells, and the solar cells’ properties were also investigated. We had found that substrates to get the optimally solar cells’ efficiency were 200 °C-deposited GZO-SiN_x/PI.     

Rapid Secondary Recrystallization of the Goss Texture in Fe81Ga19 Sheets Using Nanosized NbC Particles

Herein, a simple and efficient method is proposed for fabricating Fe₈₁Ga₁₉ alloy thin sheets with a high magnetostriction coefficient. Sharp Goss texture ({110}<001>) was successfully produced in the sheets by rapid secondary recrystallization induced by nanosized NbC particles at low temperatures. Numerous NbC precipitates (size ~90 nm) were obtained after hot rolling, intermediate annealing, and primary recrystallization annealing. The relatively higher quantity of nanosized NbC precipitates with 0.22 mol% resulted in finer and uniform grains (~10 μm) through thickness after primary recrystallization annealing. There was a slow coarsening of the NbC precipitates, from 104 nm to 130 nm, as the temperature rose from 850 °C to 900 °C in a pure nitrogen atmosphere, as well as a primary recrystallization textured by strong γ fibers with a peak at {111} <112> favoring the development of secondary recrystallization of Goss texture at a temperature of 850 °C. Matching of the appropriate inhibitor characteristics and primary recrystallization texture guaranteed rapid secondary recrystallization at temperatures lower than 950 °C. A high magnetostriction coefficient of 304 ppm was achieved for the Fe₈₁Ga₁₉ sheet after rapid secondary recrystallization.     

Cobalt Minimisation in Violet Co3P2O8 Pigment

This study considers the limitations of cobalt violet orthophosphate, Co₃P₂O₈, in the ceramic industry due to its large amount of cobalt. Mg_xCo_3−xP₂O₈ (0 ≤ x ≤ 3) solid solutions with the stable Co₃P₂O₈ structure were synthesised via the chemical coprecipitation method. The formation of solid solutions between the isostructural Co₃P₂O₈ and Mg₃P₂O₈ compounds decreased the toxically large amount of cobalt in this inorganic pigment and increased the melting point to a temperature higher than 1200 °C when x ≥ 1.5. Co₃P₂O₈ melted at 1160 °C, and compositions with x ≥ 1.5 were stable between 800 and 1200 °C. The substitution of Co(II) with Mg(II) decreased the toxicity of these materials and decreased their price; hence, the interest of these materials for the ceramic industry is greater. An interesting purple colour with a* = 31.6 and b* = −24.2 was obtained from a powdered Mg_2.5Co_0.5P₂O₈ composition fired at 1200 °C. It considerably reduced the amount of cobalt, thus improving the colour of the Co₃P₂O₈ pigment (a* = 16.2 and b* = −20.1 at 1000 °C). Co₃P₂O₈ is classified as an inorganic pigment (DCMA-8-11-1), and the solid solutions prepared were also inorganic pigments when unglazed. When introducing 3% of the sample (pigment) together with enamel, spreading the mixture on a ceramic support and calcining the whole in an electric oven, a colour change from violet to blue was observed due to the change in the local environment of Co(II), which could be seen in the UVV spectra of the glazed samples with the displacement of the bands towards higher wavelengths and with the appearance of a new band assigned to tetrahedral Co(II). This blue colour was also obtained with Co₂SiO₄, MgCoSiO₄ or Co₃P₂O₈ pigments containing a greater amount of cobalt.     

Corrosion Properties of Cr27Fe24Co18Ni26Nb5 Alloy in 1 N Sulfuric Acid and 1 N Hydrochloric Acid Solutions

The composition of the Cr₂₇Fe₂₄Co₁₈Ni₂₆Nb₅ high-entropy alloy was selected from the FCC phase in a CrFeCoNiNb alloy. The alloy was melted in an argon atmosphere arc-furnace, followed by annealing in an air furnace. The dendrites of the alloy were in the FCC phase, and the eutectic interdendrites of the alloy comprised HCP and FCC phases. The microstructures and hardness of this alloy were examined; the results indicated that this alloy was very stable. This microstructure and hardness of the alloy almost remained the same after annealing at 1000 °C for 24 h. The polarization behaviors of Cr₂₇Fe₂₄Co₁₈Ni₂₆Nb₅ alloy in 1 N sulfuric acid and 1 N hydrochloric acid solutions were measured. Both the corrosion potential and the corrosion current density of the Cr₂₇Fe₂₄Co₁₈Ni₂₆Nb₅ alloy increased with increasing test temperatures. The activation energies of the Cr₂₇Fe₂₄Co₁₈Ni₂₆Nb₅ alloy in these two solutions were also calculated.     

The Effect of Heat Treatment on the Corrosion Resistance of Fe-Based Amorphous Alloy Coating Prepared by High Velocity Oxygen Fuel Method

In this study, Fe₄₀Cr₁₉Mo₁₈C₁₅B₈ amorphous coatings were prepared using high velocity oxygen fuel (HVOF) technology. Different temperatures were used in the heat treatment (600 °C, 650 °C, and 700 °C) and the annealed coatings were analyzed by DSC, SEM, TEM, and XRD. XRD and DSC results showed that the coating started to form a crystalline structure after annealing at 650 °C. From the SEM observation, it can be found that when the annealing temperature of the Fe-based amorphous alloy coating reached 700 °C, the surface morphology of the coating became relatively flat. TEM observation showed that when the annealing temperature of the Fe-based amorphous alloy coating was 700 °C, crystal grains in the coating recrystallized with a grain size of 5–20 nm. SAED analysis showed that the precipitated carbide phase was M₂₃C₆ phase with different crystal orientations (M = Fe, Cr, Mo). Finally, the corrosion polarization curve showed that the corrosion current density of the coating after annealing only increased by 9.13 μA/cm², which indicated that the coating after annealing treatment still had excellent corrosion resistance. It also proved that the Fe-based amorphous alloy coating can be used in high-temperature environments. XPS analysis showed that after annealing FeO and Fe₂O₃ oxide components increased, and the formation of a large number of crystals in the coating resulted in a decrease in corrosion resistance.     

Engineered Heusler Ferrimagnets with a Large Perpendicular Magnetic Anisotropy

Synthetic perpendicular magnetic anisotropy (PMA) ferrimagnets consisting of 30-nm-thick D0₂₂-MnGa and Co₂MnSi (CMS) cubic Heusler alloys with different thicknesses of 1, 3, 5, 10 and 20 nm, buffered and capped with a Cr film, are successfully grown epitaxially on MgO substrate. Two series samples with and without post annealing at 400 ^°C are fabricated. The (002) peak of the cubic L2₁ structure of CMS films on the MnGa layer is observed, even for the 3-nm-thick CMS film for both un-annealed and annealed samples. The smaller remnant magnetization and larger switching field values of CMS (1–20 nm)/MnGa (30 nm) bilayers compared with 30-nm-thick MnGa indicates antiferromagnetic (AFM) interfacial exchange coupling (J_ex) between MnGa and CMS films for both un-annealed and annealed samples. The critical thickness of the CMS film for observing PMA with AFM coupling in the CMS/MnGa bilayer is less than 10 nm, which is relatively large compared to previous studies.     

Preparation and Characterization of Cu and Ni on Alumina Supports and Their Use in the Synthesis of Low-Temperature Metal-Phthalocyanine Using a Parallel-Plate Reactor

Ni- and Cu/alumina powders were prepared and characterized by X-ray diffraction (XRD), scanning electronic microscope (SEM), and N₂ physisorption isotherms were also determined. The Ni/Al₂O₃ sample reveled agglomerated (1 μm) of nanoparticles of Ni (30–80 nm) however, NiO particles were also identified, probably for the low temperature during the H₂ reduction treatment (350 °C), the Cu/Al₂O₃ sample presented agglomerates (1–1.5 μm) of nanoparticles (70–150 nm), but only of pure copper. Both surface morphologies were different, but resulted in mesoporous material, with a higher specificity for the Ni sample. The surfaces were used in a new proposal for producing copper and nickel phthalocyanines using a parallel-plate reactor. Phthalonitrile was used and metallic particles were deposited on alumina in ethanol solution with CH₃ONa at low temperatures; ≤60 °C. The mass-transfer was evaluated in reaction testing with a recent three-resistance model. The kinetics were studied with a Langmuir-Hinshelwood model. The activation energy and Thiele modulus revealed a slow surface reaction. The nickel sample was the most active, influenced by the NiO morphology and phthalonitrile adsorption.     

Mechanical Properties of Titanium Nitride Nanocomposites Produced by Chemical Precursor Synthesis Followed by High-P,T Treatment

We investigated the high-P,T annealing and mechanical properties of nanocomposite materials with a highly nitrided bulk composition close to Ti₃N₄. Amorphous solids were precipitated from solution by ammonolysis of metal dialkylamide precursors followed by heating at 400–700 °C in flowing NH₃ to produce reddish-brown amorphous/nanocrystalline materials. The precursors were then densified at 2 GPa and 200–700 °C to form monolithic ceramics. There was no evidence for N₂ loss during the high-P,T treatment. Micro- and nanoindentation experiments indicate hardness values between 4–20 GPa for loads ranging between 0.005–3 N. Young''s modulus values were measured to lie in the range 200–650 GPa. Palmqvist cracks determined from microindentation experiments indicate fracture toughness values between 2–4 MPa·m^1/2 similar to Si₃N₄, SiC and Al₂O₃. Significant variations in the hardness may be associated with the distribution of amorphous/crystalline regions and the very fine grained nature (~3 nm grain sizes) of the crystalline component in these materials.     

Fabrication of Multiferroic Co-Substituted BiFeO3 Epitaxial Films on SrTiO3 (100) Substrates by Radio Frequency Magnetron Sputtering

The 10 at.% Co-substituted BiFeO₃ films (of thickness 50 nm) were successfully prepared by radio frequency (r.f.) magnetron sputtering on SrTiO₃ (100) substrates with epitaxial relationships of [001](001)Co-BiFeO₃//[001](001)SrTiO₃. In this study, a single phase Co-substituted BiFeO₃ epitaxial film was fabricated by r.f. magnetron sputtering. Sputtering conditions such as Ar, O₂ gas pressure, annealing temperature, annealing atmosphere, and sputtering power were systematically changed. It was observed that a low Ar gas pressure and low sputtering power is necessary to suppress the formation of the secondary phases of BiO_x. The Co-substituted BiFeO₃ films were crystalized with post-annealing at 600 °C in air. The process window for single phase films is narrower than that for pure BiFeO₃ epitaxial films. By substituting Fe with Co in BiFeO₃, the magnetization at room temperature increased to 20 emu/cm³. This result suggests that Co-substituted BiFeO₃ films can be used in spin-filter devices.     

Effect of Higher Silicon Content and Heat Treatment on Structure Evolution and High-Temperature Behaviour of Fe-28Al-15Si-2Mo Alloy

This paper describes the structure and properties of cast Fe₃Al-based alloy doped with 15 at. % of silicon and 2 at. % of molybdenum. The higher content of silicon is useful for the enhancement of high-temperature mechanical properties or corrosion resistance of iron aluminides but deteriorates their workability due to increased brittleness. It was found that the presence of both alloying elements leads to an increase of values of the high-temperature yield stress in compression. The heat treatment (annealing at 800 °C for 100 h) used for the achievement of phase stability causes the grain coarsening, so the values of the high-temperature yield stress in compression are lower at 600 °C and 700 °C in comparison to values measured for the as-cast state. This stabilization annealing significantly improves the workability/machinability of alloy. Furthermore, the higher silicon content positively affects the values of the thermal expansion coefficient that was found to be lower in the temperature range up to 600 °C compared to alloys with lower content of silicon.     

Sol-Gel Synthesis and Antioxidant Properties of Yttrium Oxide Nanocrystallites Incorporating P-123

Yttrium oxide (Y₂O₃) nanocrystallites were synthesized by mean of a sol-gel method using two different precursors. Raw materials used were yttrium nitrate and yttrium chloride, in methanol. In order to promote oxygen vacancies, P-123 poloxamer was incorporated. Synthesized systems were heat-treated at temperatures from 700 °C to 900 °C. Systems at 900 °C were prepared in the presence and absence of P-123 using different molar ratios (P-123:Y = 1:1 and 2:1). Fourier transform infrared spectroscopy (FTIR) results revealed a characteristic absorption band of Y–O vibrations typical of Y₂O₃ matrix. The structural phase was analyzed by X-ray diffraction (XRD), showing the characteristic cubic phase in all systems. The diffraction peak that presented the major intensity corresponded to the sample prepared from yttrium chloride incorporating P-123 in a molar ratio of P-123:Y = 2:1 at 900 °C. Crystallites sizes were determined by Scherrer equation as between 21 nm and 32 nm. Antioxidant properties were estimated by 2,2-diphenyl-1-picrylhydrazyl (DPPH•) assays; the results are discussed.     

Role of Liquid-Phase Amount in Ceramization of Silicone Rubber Composites and Its Controlling

The reliable mechanical properties of ceramizable silicone rubber composites during pyrolysis are necessary for their application in the fire-resistant fields. The effects of liquid-phase amount on the mechanical properties of silicone rubber composites are investigated. The results show a positive correlation between the liquid-phase amount and the flexural strength of the residual products pyrolysis below 800 °C. The nano-γ-Al₂O₃ in the fillers reacts with liquid B₂O₃ to form aluminum borate above 800 °C, which consumes the liquid phase and strengthens the residual products to a certain extent. Increasing the B₂O₃ addition and introducing nano-γ-Al₂O₃ can control the liquid-phase amount in the range of 15% to 30%, which makes the composites have better residual strength and support performance. The residual strength of composites pyrolysis at 500 °C to 1000 °C is higher than 2.50 MPa, and the maximum is up to 18.7 MPa at 1000 °C.     

Co-Dispersion Behavior of ZrB2–SiC–B4C–C Powders with Polyethyleneimine

The aqueous dispersion behavior of ZrB₂, SiC powders with B₄C and C as sintering aids was investigated. Well co-dispersed suspension can be obtained in acidic solutions in presence of polyethyleneimine (PEI). The adsorption of PEI on the powder surface was measured by thermal gravimetric (TG) analysis. Rheological measurements displayed the effect of dispersant on the flow behavior of as-prepared slurries. An optimum condition was obtained with 1 wt % PEI. The viscosity of 40 vol % ZrB₂–SiC–B₄C–C (ZSBC) suspension at 100 s⁻¹ was as low as 0.74 Pa·s, which was suitable for aqueous processing.     

Fabrication of TiO2 – KH550 – PEG Super-Hydrophilic Coating on Glass Surface without UV/Plasma Treatment for Self-Cleaning and Anti-Fogging Applications

In this study, we have developed a self-cleaning transparent coating on a glass substrate by dip coating a TiO₂ – KH550 – PEG mixed solution with super-hydrophilicity and good antifogging properties. The fabrication of the thin-film-coated glass is a one-step solution blending method that is performed by depositing only one layer of modified TiO₂ nanoparticles at room temperature. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to determine the structure and morphology of the nanoparticles and the thin-film-coated glass. The surface functional groups were investigated using Fourier-transform infrared spectroscopy (FT-IR), and the optical properties of the glass coating were measured using a UV/Vis spectrometer. The results revealed that the KH-500-modified TiO₂ film coating was in an anatase crystalline form. The hydrophilicity of the coated and uncoated glass substrates was observed by measuring their water contact angle (WCA) using a contact angle instrument. The maximum transparency of the coated glass measured in the visible region (380–780 nm) was approximately 70%, and it possessed excellent super-hydrophilic properties (WCA ~0°) at an annealing temperature of 350 °C without further need of UV or plasma treatment. These results demonstrate the super-hydrophilic coated glass surface has potential for use in self-cleaning and anti-fogging applications.     

Effects of TiB2 Particles on the Microstructure Evolution and Mechanical Properties of B4C/TiB2 Ceramic Composite

B₄C/TiB₂ ceramic composites reinforced with three size scales (average particle size: 7 μm, 500 nm, and 50 nm) of TiB₂ were prepared by using a pressureless sintering furnace at 2100 °C under Ar atmosphere for 60 min. The results demonstrated that during the sintering process, TiB₂ located on the boundaries between different B₄C grains could inhibit the grain growth which improved the mass transport mechanism and sintering driving force. A semi-coherent interface between B₄C and SiC was found, which is supposed to help to reduce the interface energy and obtain good mechanical properties of the B₄C/TiB₂ ceramic composite. On sample cooling from sintering temperature to room temperature, the residual tensile stress fields formed at the TiB₂ interfaces owning to the thermo-elastico properties mismatched, which might have contributed to increase the ability of the sample to resist crack propagation. The results showed that the relative density, Vickers hardness, and fracture toughness of the composite with 20 wt.% submicron and 10 wt.% nano-TiB₂ were significantly improved, which were 98.6%, 30.2 GPa, and 5.47 MPa·m^1/2, respectively.