Development of moisture-proof polydimethylsiloxane/aluminum oxide film and stability improvement of perovskite solar cells using the film |
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| Authors: | Eun Young Choi Ju-Hee Kim Bu-Jong Kim Ji Hun Jang Jincheol Kim Nochang Park |
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| Affiliation: | Electronic Convergence Material & Device Research Center, Korea Electronics Technology Institute, Seong-Nam Republic of Korea, +82-31-789-7057 ; Australian Centre for Advanced Photovoltaics (ACAP), School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Sydney 2052 Australia |
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| Abstract: | ![]()
A method for enhancing the moisture barrier property of polydimethylsiloxane (PDMS) polymer films is proposed. This is achieved by filling the PDMS free volume with aluminum oxide (AlOx). To deposit AlOx inside PDMS, thermal atomic layer deposition (ALD) is employed. The PDMS/AlOx film thus produced has a 30 nm AlOx layer on the surface. Its water vapor transmission rate (WVTR) is 5.1 × 10−3 g m−2 d−1 at 45 °C and 65% relative humidity (RH). The activation energy of permeability with the PDMS/AlOx film for moisture permeation is determined to be 35.5 kJ mol−1. To investigate the moisture barrier capability of the PDMS/AlOx layer, (FAPbI3)0.85(MAPbBr3)0.15/spiro-OMeTAD/Au perovskite solar cells are fabricated, and encapsulated by the PDMS/AlOx film. To minimize the thermal damage to solar cells during ALD, AlOx deposition is performed at 95 °C. The solar cells exposed to 45 °C-65% RH for 300 h demonstrate less than a 5% drop in the power-conversion efficiency.A method for enhancing the moisture barrier property of polydimethylsiloxane (PDMS) polymer films is proposed. This is achieved by filling the PDMS free volume with aluminum oxide (AlOx). |
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