Intraoperative retinal light damage reflected in electrophysiologic data |
| |
| Authors: | Manfred Lessel MD Arnulf Thaler Peter Heilig Wolfgang Jantsch Viktor Scheiber |
| |
| Affiliation: | (1) Department of Ophthalmology, University of Vienna, Vienna, Austria;(2) Institute for Experimental Physics, J. Kepler University, Linz, Austria;(3) Department of Medical Statistics and Documentation, University of Vienna, Vienna, Austria;(4) Department of Ophthalmology, University of Vienna, Alserstasse 4, A-1090 Vienna, Austria |
| |
| Abstract: | In a series of 30 unilaterally pseudophakic patients, electroretinograms and electrooculograms were recorded 6 months postoperatively. The unoperated on fellow eyes served as controls High intraoperative retinal light exposure (3.4–7.3 mW/cm2, Zeiss OPMI 6 operating microscope) caused a substantial reduction of electrophysiologic potentials. Light protection prevented deterioration of electroretinogram and electro-oculogram potentials; reducing the bulb voltage, tilting the axis of illumination, filtering short wavelengths and the use of light shields resulted in 4-log-unit lower intensities (0.8–3.7  W/cm2).Abbreviations ACL anterior chamber lens - ECCE extracapsular cataract extraction - ICCE intracapsular cataract extraction - PCL posterior chamber lens |
| |
| Keywords: | Electro-oculogram electroretinogram light protection operating microscope retinal light damage |
| 本文献已被 SpringerLink 等数据库收录！ |
|
