首页 | 本学科首页   官方微博 | 高级检索  
检索        

颞叶新皮质癫痫手术的疗效分析
引用本文:黄灵团,李国成,农大件.颞叶新皮质癫痫手术的疗效分析[J].中华神经外科疾病研究杂志,2012,11(6):539-542.
作者姓名:黄灵团  李国成  农大件
作者单位:广西壮族自治区脑科医院神经外科,广西柳州,545005
摘    要:目的分析总结颞叶新皮质癫痫患者临床特征、术前评估、手术方法和疗效。方法对36例颞叶新皮质癫痫行神经电生理、MRI,正电子发射计算断层显像计算机体层扫描(PET—CT)定位,术中皮层电极和深部电极描记,联合采用不同术式以及术后随访6个月至2年的疗效观察。结果疗效按谭启富的标准分类:Ⅰ级12例,Ⅱ级11例,Ⅲ级8例,Ⅳ级5例,Ⅴ级0例。病理报告:胶质增生23例;微小血管畸形5例;灰质异位1例,无异常发现7例。无手术致残和死亡。结论联合采取不同术式,如:行海马及杏仁核部分切除,对颞叶新皮质癫痫可达到良好的治疗效果,且无严重手术并发症。

关 键 词:颞叶新皮质癫痫  外科治疗  病灶切除术

Surgical treatment of neocortical temporal lobe epilepsy
HUANG Lingtuan , LI Guocheng , NONG Dajian.Surgical treatment of neocortical temporal lobe epilepsy[J].Chinese Journal of Neurosurgical Disease Research,2012,11(6):539-542.
Authors:HUANG Lingtuan  LI Guocheng  NONG Dajian
Institution:HUANG Lingtuan, LI Guocheng, NONG Dafian Department of Neurosurgery, Guangxi Brain Hospital, Liuzhou 545005, China
Abstract:Objective To explore the clinical features, the pre-operative evaluation, surgical methods and outcome of neocortieal temporal lobe epilepsy (NILE). Methods Epileptogenic focus were exactly localized by electroencephalogram (EEG), magnetic resonance imaging ( MRI ), and positron emission tomography (PET). Intraoperative electrocorticography (ECOG) and depth EEG (DEEG) of 36 patients with NTLE were recorded. All the patients were followed up from 6 months to 2 years, Results According to Tang standard there were 13 eases of grade I, 11 cases of grade 11, 8 eases of grade III , and 4 eases of grade IV. All the cases were performed pathological examination: 23 eases of gliosis, 5 cases of vascular malfornmtion, l case of cortical heterotopia, and 7 cases of no changes. No dead ease or the operation-related disabled case. Conclusion Different surgical methods, such as, hippocampus and almond-pit partial resection, contribute to a good outcome of surgery for neocortical temporal lobe epileosy (NTLE).
Keywords:Neocortical temporal lobe epilepsy  Surgical treatment  Focus resection
本文献已被 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号