首页 | 本学科首页   官方微博 | 高级检索  
检索        

前牙区微创延期即刻种植临床研究
引用本文:陈剑云,许晋,金凯,李小新.前牙区微创延期即刻种植临床研究[J].中国现代医生,2012,50(13):35-37.
作者姓名:陈剑云  许晋  金凯  李小新
作者单位:温州医学院附属第三医院口腔颌面外科,浙江瑞安,325200
摘    要:目的研究微创延期即刻种植术的近期临床效果。方法选择前牙区微创拔牙患者41例,随机分成A组和B组。拔牙后4~8周分别用微创不翻瓣(A组)和翻瓣(B组)两种方法植入ITl种植体。收集手术时间、疼痛反应、种植体存留率、咀嚼功能和软硬组织状况等数据进行统计分析。结果A组在手术时间、肿胀、疼痛反应、牙槽嵴顶吸收和牙龈乳头指数较B组佳,P〈0.05。全部病例存留率100%,能行使正常咀嚼功能。结论前牙区微创拔牙后行微创延期即刻种植.近期效果可靠.可临床府用推广.

关 键 词:牙种植  前牙  微创  延期即刻种植

Clinical study of minimally invasive delayed immediate implant in anterior region
Authors:CHEN Jianyun  XU Jin  JIN Kai  LI Xiaoxin
Institution:Department of Oral and Maxillofacial Surgery,the Third Affiliated Hospital of Wenzhou Medical College,Ruian 325200,China
Abstract:Objective To evaluate the short-term clinical treatment effects of delayed immediate implant in the anterior region.Methods All of 41 patients with anterior tooth extraction by minimally invasive surgery were selected.All patients randomly divided into group A and group B.4-8 weeks after tooth extraction,group A were placed ITI implants utilizing a minimally invasive flapless approach,and group B were also placed ITI implants utilizing a flap surgery.Collection data of operative time,swelling and pain response,implant retention rate,masticatory function,hard and soft tissue conditions.SPSS12.0 software was used to analyze the data with chi-square analysis and rank sum test.P < 0.05 was statistically significant.Results The operative time,swelling response,pain response,absorption of the alveolar crest and the gingival papilla index of group A were statistically significant better than that of group B,P < 0.05.Retention rate of 100% in all cases,and the masticatory function was normal.Conclusion The short-term effect of minimally invasive delayed immediate implant in anterior region after minimally invasive extraction was satisfactory.It can be applied in clinical use.
Keywords:Implant  Anterior teeth  Minimally invasive  Delayed immediate implant
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号