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CdS-Decorated Porous Anodic SnOx Photoanodes with Enhanced Performance under Visible Light
Authors:Karolina Gawlak,Dominika Popioł  ek,Marcin Pisarek,Grzegorz D. Sulka,Leszek Zaraska
Affiliation:1.Department of Physical Chemistry and Electrochemistry, Faculty of Chemistry, Jagiellonian University, Gronostajowa 2, 30-387 Krakow, Poland; (D.P.); (G.D.S.);2.Laboratory of Surface Analysis, Institute of Physical Chemistry, Polish Academy of Sciences, Kasprzaka 44/52, 01-224 Warsaw, Poland;
Abstract:Electrochemically generated nanoporous tin oxide films have already been studied as photoanodes in photoelectrochemical water splitting systems. However, up to now, the most significant drawback of such materials was their relatively wide band gap (ca. 3.0 eV), which limits their effective performance in the UV light range. Therefore, here, we present for the first time an effective strategy for sensitization of porous anodic SnOx films with another narrow band gap semiconductor. Nanoporous tin oxide layers were obtained by simple one-step anodic oxidation of metallic Sn in 1 M NaOH followed by further surface decoration with CdS by the successive ionic layer adsorption and reaction (SILAR) method. It was found that the nanoporous morphology of as-anodized SnOx is still preserved after CdS deposition. Such SnOx/CdS photoanodes exhibited enhanced photoelectrochemical activity in the visible range compared to unmodified SnOx. However, the thermal treatment at 200 °C before the SILAR process was found to be a key factor responsible for the optimal photoresponse of the material.
Keywords:tin oxides   anodization   porous films   CdS   photoelectrochemistry
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