磁性固位种植总义齿的应力分析

【目的】了解磁性固位的下颌种植覆盖义齿的应力状况及其分布规律 ,为磁性固位体的临床应用提供生物力学依据。【方法】采用二维光弹应力分析法 ,分析圆柱形种植体在垂直向和侧向加载条件下种植体—骨界面的应力状况。【结果】种植体应力主要为均匀分布的压应力 ,最大应力位于种植体根尖部 ,颈部应力相对较小 ,未见明显弯曲应力。【结论】磁性固位种植义齿的种植体应力分布符合生物力学要求 ,有利于种植体的长期成功

The Stress Analysis on the Implant Supported Complete Overdenture with Magnetic Attachments

Objective In order to analyse the stress distribution of the mandibular full overdenture supported by implants with magnetic attachments. Method Two dimensional photoelastic stress analysis were used in this study. The vertical and lateral forces were loaded on the column shape implants. Results The stress on implant bone interface was about equally distributing compressive stress. The maximum stress was on the apices and the stress on the cervical part was lower. There was no bent stress. Conclusion The stress distribution of the mandibular complete overdenture supported by implants with magnetic attachments was suitable for the biomechanical needs of implant and was benefit to implant success.