首页 | 本学科首页   官方微博 | 高级检索  
     

大鼠应激性溃疡发病机制及其防治方法的研究
引用本文:宗育杉 吴胜群. 大鼠应激性溃疡发病机制及其防治方法的研究[J]. 中国危重病急救医学, 1995, 7(5): 265-267
作者姓名:宗育杉 吴胜群
作者单位:天津市第一中心医院急救医学研究所
摘    要:
为进一步了解应激性溃疡的发病机制,寻找更有效的治疗方法。以冷束缚法制成大鼠应激性溃疡动物模型。将其分成对照组、治疗A组(西米替丁组)、治疗B组(东莨菪碱组)和治疗C组(西米替丁+东莨菪碱组),通过溃疡指教、光镜与电镜观察各组病理组织学变化。结果:治疗C组防治效果优于治疗A组及B组。作者认为:在应激状态下,胃粘膜局部血循环障碍与胃内pH过低是导致损伤的重要始动因素;综合使用抑酸与促进血循环的防治方法,其效果明显优于单纯抑酸方法。

关 键 词:溃疡病 应激性 病理 预防 治疗

Experimental researches on pathogenic mechanisms,prevention,and therapy of stress ulceration in rats.
/ZHONG Yushan, WU Shengqun, LI zhijun et al.//Chi-nese critical Care Medicine,. Experimental researches on pathogenic mechanisms,prevention,and therapy of stress ulceration in rats.[J]. Chinese critical care medicine, 1995, 7(5): 265-267
Authors:/ZHONG Yushan   WU Shengqun   LI zhijun et al.//Chi-nese critical Care Medicine  
Abstract:
In order to further understand pathogenic mecha-nism of stress ulceration and explore a more e ffectivetherapy,the aninal model of stress ulceration was madein rats which were divided into control group,treatmentgroup A(with cimetidine ), treatment group B ( withscopolamine),and treatment group C ( with cimetidineplus scopolamine).By means of the measurement of ul-cerative index, observation of the pathophysiologicchanges under light microscope and eletronmicroscopeand ultramicrohistology, we found that the curative of-fect of treatment group C was better than treatmentgroup A and B. It is considered that, under stress condi-tions, the disturbance of local blood circulation of thegastric mucosa and the extremly lowered intragastric pHare the important primary factors for inducing the in-jury.So that the curative effects by both inhibiting acidand promoting bloor circulation sinthetically are signifi-cantly bigher than by only inhibiting acid oniy. For thisreason, the combined use of antacids and promotingblood circulation is superior to the use of antacids alone.
Keywords:experimental stress ulceration  pathogenesis  
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号